陈强

发布时间:2016-07-29浏览次数:10

个人简介:

    陈强,博士,厦门大学电子科学系副教授(2014.04-)。任现职前,先后在日本东北大学(2009-2012)和东京大学(2012-2014)工作。主要研究放电等离子体,涉及等离子体电化学、等离子体与生物相互作用、基于等离子体-液体相互作用的纳米材料合成、等离子体高速刻蚀、以及等离子在环境治理方面的应用等;另外,陈博士的研究也涉及等离激元太阳能电池(Plasmonic Solar Cell)。 迄今为止, 在本领域著名专业期刊如Appl. Phys. Lett., J. Appl. Phys., Nano Energy, Appl. Phys. Express, Chem. Phys. Lett.等发表论文24篇, 其中SCI收录论文21,第一或通讯作者SCI论文14篇。曾先后获得日本文部省国费奖学金(2005-2009),日本学术振兴会外国人特别研究员奖励费(JSPS,2009-2011),以及第十五届国际薄固态膜会议研究鼓励奖(2011);担任10多种国际期刊的审稿人,包括Appl. Phys. Lett., J. Appl. Phys., Plasma Process. Polym., Plasma Sources Sci. Technol., Chem. Phys. Lett.等。


招生单位:电磁声学研究院


教育背景:

2006.04–2009.03  日本埼玉大学   工学博士

2005.10–2006.03  日本埼玉大学   研究生

1998.09–2002.06  兰州大学     凝聚态物理硕士

1998.09–2002.06  兰州大学     物理学学士


工作经历:

2014.04– 至 今  厦门大学    副教授

2012.04–2014.03  日本东京大学  特任研究员

2009.04–2012.03  日本东北大学  JSPS和GCOE研究员


学会会员:

2006-现在  日本应用物理学会会员

2009-现在  日本等离子体核融合学会会员

2015-现在  Division of Plasma Physics Association of Asia Pacific Physical Societies 会员


研究领域:

开发大面积大气压等离子体源以及应用它们于材料制备,生物材料处理,表面改性,医学等领域。

基于等离子体–液体相互作用的纳米材料合成。

等离子体与液体以及生物材料等相互作用的物理化学过程。

等离子体数值模拟。


联系方式

地址:厦门大学物理科学与技术学院

电话: +86-0592-2188176

E-mail: chenqiang@xmu.edu.cn


科研项目

 国家自然科学基金:2015-2017

 厦门大学校长基金:2015-2017


著作

 Y. Li, Q. Chen, D. He, and J. Li, “Advanced Radial pn Junction Solar Cells Constructed on Silicon Nanowire Arrays”, pp.359-392, Book Chapter 14 in Volume 8 (Volume ISBN:1-62699-008-5) titled 'Electonics and Photovoltaics' in the 10-volume book set on NANOTECHNOLOGY (Series ISBN:1-62699-000-X) (Studium Press LLC, 2013).


获奖

 2011.11 薄膜研究鼓励奖, 第十五届国际薄固态膜会议, 日本京都

 2009.11–2011.12 日本学术振兴会外国人特别研究员奖励费(JSPS)

 2005.10–2009.03 日本文部科学省国费奖学金


代表性论文

 Q. Chen*, J. Li, and Y. Li, “A review of plasma–liquid interactions for nanomaterial synthesis”, Invited Review in J. Phys. D 48 (2015) 424005.

 Y. Li, Q. Chen, D. He, and J. Li, “Radial junction Si micro/nano-wire array photovoltaics: Recent progress from theoretical investigation to experimental realization”, Nano Energy 7 (2014) 10.

 Q. Chen*, S. Tsuchiya, and T. Ichiki, “Diagnostics of Expanding Mesoplasmas Originated from a Miniaturized Inductively Coupled Plasma and their Application to Si Etching”, Jpn. J. Appl. Phys. 53 (2014) 03DB03.

 Q. Chen, T. Kaneko, N. Matsuda, and R. Hatakeyama, “Potential structure of discharge plasma inside liquid directly measured by an electrostatic probe”, Appl. Phys. Lett. 102 (2013) 244105.

 Q. Chen* and J. S. Li, “Observation of positive self-bias in a radio frequency atmospheric pressure microplasma”, IEEE Trans. Plasma Sci. 41 (2013) 826.

 Q. Chen* and H. Shirai, “Large-area cold atmospheric pressure discharges realized by mesh covered tube-plate electrodes in open air”, IEEE Trans. Plasma Sci. 41 (2013) 421.

 Y. Li, Q. Chen, T. Kaneko, and R. Hatakeyama, “Synthesis of graphene nanosheets from petroleum asphalt by pulsed arc discharge in water”, Chem. Eng. J. 215-216 (2013) 45.

 Q. Chen*, T. Kaneko, and R. Hatakeyama, “Synthesis of superfine ethanol-soluble CoO nanoparticles via discharge plasma in liquid”, Appl. Phys. Express 5 (2012) 096201.

 Q. Chen, T. Kaneko*, and R. Hatakeyama, “Reductants in gold nanoparticle synthesis using gas–liquid interfacial discharge plasmas” Appl. Phys. Express 5 (2012) 086201.

 Q. Chen* and H. Shirai, “Diagnostics of atmospheric pressure microplasma with a liquid electrode”, Eur. Phys. J. D 66 (2012) 161.

 T. Kaneko, Q. Chen, and R. Hatakeyama, “Synthesis of nano-bio conjugates for drug delivery systems using gas-liquid interfacial discharge plasmas”, J. Korean Phys. Soc. 60 (2012) 929.

 Q. Chen*, T. Kaneko, and R. Hatakeyama, “Rapid synthesis of water-soluble gold nanoparticles with control of size and assembly using gas-liquid interfacial discharge plasma”, Chem. Phys. Lett. 521 (2011) 113.

 Q. Chen*, T. Kaneko, and R. Hatakeyama, “Effects of DNA on gold nanoparticle synthesis using gas-liquid interfacial pulse discharge plasma”, Tran. Mater. Res. Soc. Jpn. 36 (2011) 483.

 Q. Chen*, T. Kaneko, and R. Hatakeyama, “Characterization of pulse-driven gas-liquid interfacial discharge plasmas and application to synthesis of gold nanoparticle-DNA encapsulated carbon nanotubes”, Curr. Appl. Phys. 11 (2011) S63.

 T. Kaneko, Q. Chen, T. Harada, and R. Hatakeyama, “Structural and reactive kinetics in gas-liquid interfacial plasmas”, Plasma Sources Sci. Technol. 20 (2011) 034014.

 Q. Chen*, T. Kaneko, and R. Hatakeyama, “Effects of ionic liquid electrode on pulse discharge plasmas in the wide range of gas pressures”, J. Appl. Phys. 108 (2010) 103301.

 Q. Chen* and K. Huang, “Comment on ‘Effects of the medium on synthesis of nanopowders by wire explosion process’ [Appl. Phys. Lett. 91, 141501 (2007)]”, Appl. Phys. Lett. 92 (2008) 106101.

 Q. Chen* and K. Huang, “Comment on ‘Effects of the medium on synthesis of nanopowders by wire explosion process’ [Appl. Phys. Lett. 91, 141501 (2007)]”, Appl. Phys. Lett. 92 (2008) 106101.

 Q. Chen, Y. Takemura, K. Saito, and H. Shirai, “Physicochemistry of the plasma-electrolyte solution interface”, Thin Solid Films 516 (2008) 6688.

 Q. Chen, T. Kitamura, K. Saito, K. Haruta, Y. Yamano, T. Ishikawa, and H. Shirai, “Microplasma discharge within ethanol solution: Characterization and its application to the synthesis of carbon microstructures”, Thin Solid Films 516 (2008) 4435.

 J. Li, J. Wang, M. Yin, P. Gao, D. He, Q. Chen, Y. Li, and H. Shirai, “Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition”, J. Appl. Phys. 103 (2008) 043505.

 贺德衍,王晓强,陈 强,栗军帅,尹 旻,A. V. Karabutov,A. G. Kazanskii,“电感耦合等离子体 CVD 室温制备的纳米 Si 薄膜场电子发射研究”, 科学通报 51 (2006)252.

 D. He, X. Wang, Q. Chen, J. Li, M. Yin, A. V. Karabutov, and A. G. Kazanskii, “Electron field emission from nano-crystalline Si films deposited by inductively coupled plasma CVD at room temperature”, Chin. Sci. Bull. 51 (2006) 510.

 D. He, X. Wang, Q. Chen, and J. Li, “Al-induced crystallization during low-temperature deposition of Si films by inductively coupled plasma CVD”, J. Korean Phys. Soc. 46 (2005) S88.

 X. Q. Wang, J. S. Li, Q. Chen, J. Qi, M. Yin, D. Y. He, “Aluminum-induced crystallization during deposition of silicon films by inductively coupled plasma CVD”, Acta Phys. Sin. 54 (2005) 269.